Numbering Code	G-ENG06 5G204 LJ51	Year/Term	2022 ・ First semester
Number of Credits	2	Course Type	Lecture
Target Year		Target Student
Language	English	Day/Period	Mon.4
Instructor name	TSUCHIYA TOSHIYUKI (Graduate School of Engineering Professor) URABE KEIICHIRO (Graduate School of Engineering Assistant Professor) HIROTANI JUN (Graduate School of Engineering Associate Professor)
Outline and Purpose of the Course	Micro/nano fabrication processes and materials used to realize micro/nano systems are described. Topics will be photolithography, dry-etching, thin-film deposition, which includes bulk micro machining, surface micro machining and further advanced polymer processing.
Course Goals	To obtain fundamental knowledge about design and fabrication of micro/nano systems and to be familiar with recent fabrication technologies and micro/nano systems.
Schedule and Contents	Week 1: introduction ・ Microfabrication and devices Week 2 to 4: Advanced semiconductor device fine processing technology ・ Front-end process flow ・ Photolithography basics and recent topics ・ Plasma etching Week 5 to 7: Basics of semiconductor physics and device application ・ Basics of semiconductor physics ・ PN junction, metal-semiconductor junction ・ Nanocarbon material and device Week 8 to 9: Silicon and micromaterials ・ Mechanical properties of silicon ・ Evaluation of mechanical properties of micro-scale materials Week 10 to 11: Silicon micromachining ・ Processing process based on semiconductor fine processing technology ・ Bulk and surface micromachining Week 12 to 14: Basics of Applied Devices ・ Electrostatic transducers and its application ・ Piezoresistive effect and its application ・ Sensors / actuators Week 15: feedback on evaluations such as reports
Evaluation Methods and Policy	Evaluated by homework. All report must be submitted to obtain credits.
Course Requirements	None
Study outside of Class (preparation and review)	Follow reports and other instructions from each person in charge.
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