Charged Particle Beam Apparatus
| Numbering Code | G-ENG11 5C801 LJ72 | Year/Term | 2022 ・ Second semester |
|---|---|---|---|
| Number of Credits | 2 | Course Type | Lecture |
| Target Year | Target Student | ||
| Language | Japanese | Day/Period | Wed.4 |
| Instructor name | GOTOU YASUHITO (Graduate School of Engineering Associate Professor) | ||
| Outline and Purpose of the Course | Fundamental technologies of an ion beam system, such as ion sources, formation and evaluation of ion beams, transport of ion beams, and ion-solid interaction will be presented. Taking ion implantation as one of the example of the ion beam application, the relationship between the incident ion energy and implantation depth will be presented. Each element of a typical ion beam system is explained in detail. | ||
| Course Goals | To understand the details of an ion beam apparatus: generation, transport and evaluation of an ion beam. Understanding of the entire ion beam apparatus as a system is also purpose of the class. | ||
| Schedule and Contents |
[Ion beam systems and their applications] Once Outline of the class is presented. Physical properties of ions in vacuum are given, and ion beam apparatuses and their application will be introduced with some typical examples. [Ion-solid interaction] 3 times Interaction between high energy ion and solid atoms are given. Major topics are: how the ions transfer their energy to the target atoms, i.e., how the ions are decelerated in the solid, and relationship between incident ion energy and implantation depth is given. Concept of sputtering phenomenon is also presented. [Nature of ion beam] Once Concept of the acceleration voltage is introduced to explain the principle of the ion beam systems. Nature of an ion beam is also presented. [Generation and transport of ion beam] 3 times Methods of ion generation for various elements are explained. Important equations of beam extraction and beam transport are given. Starting with the paraxial ray equation, concept of transfer matrix is given. Finally, some important physical parameters of ion beams are given. [Mass separators and energy analyzers] 4 times Details of magnetic sector as mass separator are given. Transfer matrix of the mass separator are presented and focusing effect is described. An important parameter of mass resolution is given. Some different kinds of energy analyzers are also introduced. Deflection and detection systems and the methods to evaluate the current of the ion beam are also introduced. [Fundamentals of vacuum engineering] Once Fundamentals of vacuum engineering is given. Several pumps used for ion beam systems are also introduced. [Design of ion beam systems] Once Design of an ion beam system under a given condition will be presented. [Feedback] Once |
||
| Evaluation Methods and Policy | Grading will be made with the results of the term-end examination. Achievements of exercises in the class are also taken into consideration. | ||
| Course Requirements | Vacuum Electronic Engineering (undergraduate course) | ||
| Study outside of Class (preparation and review) | After the class is over, confirm your understanding with the practices listed on the textbook. | ||
| References, etc. | Charged Particle Beams, Zyunzo Ishikawa, (Corona), ISBN:978-4-339-00734-3 | ||
| Related URL | |||
