Numbering Code G-ENG06 5G204 LJ51 Year/Term 2021 ・ First semester
Number of Credits 2 Course Type Lecture
Target Year Target Student
Language English Day/Period Mon.4
Instructor name TSUCHIYA TOSHIYUKI (Graduate School of Engineering Professor)
URABE KEIICHIRO (Graduate School of Engineering Assistant Professor)
Outline and Purpose of the Course Micro/nano fabrication processes and materials used to realize micro/nano systems are described. Topics will be photolithography, dry-etching, thin-film deposition, which includes bulk micro machining, surface micro machining and further advanced polymer processing.
Course Goals To obtain fundamental knowledge about design and fabrication of micro/nano systems and to be familiar with recent fabrication technologies and micro/nano systems.
Schedule and Contents Week 1: introduction
・ Microfabrication and devices
Week 2 to 4: Advanced semiconductor device fine processing technology
・ Front-end process flow
・ Photolithography basics and recent topics
・ Plasma etching
Week 5 to 7: Thin film material process
・ Formation process of thin film material which is the basis of micro system and its evaluation technology
Week 8 to 10: Silicon micromachining
・ Processing process based on semiconductor fine processing technology (silicon micromachining)
・ Mechanical properties of silicon
・ Evaluation of mechanical properties of micro-scale materials
Week 11 to 12: 3D processing lithography
・ High-aspect, three-dimensional structure fabrication methods that are important for microsystems
・ Lithography technology, etching technology
Week 13 to 14: Basics of Applied Devices
・ Sensors / actuators
・ Analysis technology
Week 15: feedback on evaluations such as reports
Evaluation Methods and Policy Evaluated by homework. All report must be submitted to obtain credits.
Course Requirements None
Study outside of Class (preparation and review) Follow reports and other instructions from each person in charge.
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